At the epicenter of miniaturization, lies the role of materials and manufacturing methods by which they can be processed efficiently. At smaller inaccessible sub-micron scales, the underlying science of these two aspects is still developing which makes the progress on this front very slow. While digitalisation of the bottom of manufacturing processes such as a growth process, can help accelerate the process, the instrumentation development necessary to monitor these will take time. An accurate understanding of nanoscale deposition processes requires an insight into the energetic, structural, dynamic and rheological aspects of the system. Experiments alone would be insufficient to meet this need and hence there is a scope for using atomic simulation to expedite this process. Moreover, with the descend of scale, surface properties start to dominate the bulk properties of materials and the complex interplay of these together contributes to significant manufacturing challenges at the nanoscale. This impedes the insertion of newer materials in healthcare, aerospace, energy and electronics e.g., carbon fibre reinforced plastic (CFRP), carbon-based 2D materials, titanium alloys, nanopolymer composite coatings and semiconductor materials like silicon and its derivative. Hence understanding the relevant atomic level phenomena is the key to obtaining full knowledge of the atomistic mechanisms underlying the growth or material removal processes to obtain a usable quality of surface whether it is to be used for an optical or for an electronics application. The talk will be covering these silent aspects while shedding light on some of the early stage work done by the speaker in firstly understanding the material removal processes and showing how the same tools of simulation are equally useful to understand the vapour growth processes which is one of the activities undertaken by the speaker as part of the EPSRC DSMN+ project.